sky130.pcells.pwell_guard_ring

sky130.pcells.pwell_guard_ring#

sky130.pcells.pwell_guard_ring(inner_width=2.0, inner_height=2.0, ring_width=0.34, spacing=0.27)[source]#

P+ substrate guard ring for NMOS isolation.

Places a ring of tap (P+ diffusion) around an inner area of size inner_width x inner_height. The ring is built from four rectangular segments whose corners overlap so there are no gaps.

Layers applied:

  • tapdrawing — ring body (substrate / well tap)

  • psdmdrawing — P+ implant, extends 0.125 um beyond tap on every side

  • li1drawing — local interconnect covering the tap ring

  • licon1drawing — LiCon contacts along every edge (via contact_array)

A port named “VSS” is placed on the li1drawing layer at the centre of the bottom edge, oriented downward (270 degrees).

Parameters:

  • inner_width (float) – width of the inner area to be surrounded.

  • inner_height (float) – height of the inner area to be surrounded.

  • ring_width (float) – width of the tap ring.

  • spacing (float) – gap between the inner area and the inner edge of the ring.

Return type:

Component

import sky130

c = sky130.pcells.pwell_guard_ring()
c.plot()

(Source code, png, hires.png, pdf)

../_images/sky130-pcells-pwell_guard_ring-1.png